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SEMI F48-0600 (technical revision)
This procedure applies only to large scale bulk purifiers rated at greater than 50 liters-per-minute (LPM) flow rate
It defines the view of the equipment through the SECS communication link
The measurement requires the fabrication of a guard-ring MOS capacitor (refer to Figure 1)
used in the area of material
HB00600 - SEMI HB6 - Test Method for Measurement of Thickness and Shape of Crystalline Sapphire Wafers by Using Optical Probes StdPbc-0817 SEMI F48-0600 (technical revision)This Standard was technically approved by the HB LED Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 4, 2015. Available at www. semiviews. org and www. semi. org in March 2016; originally published June 2015. Crystalline sapphire wafers (CSW) are used as substrates for manufacturing compound semiconductor devices, in particular high brightness light emitting diodes (HB